1st Edition

Handbook of Thin Film Process Technology, CD-ROM



ISBN 9780750304092
Published January 1, 1997 by CRC Press

USD $1,190.00

Prices & shipping based on shipping country


Preview

Book Description

The Handbook of Thin Film Process Technology, CD-ROM reproduces the text version in its entirety, including illustrations and references from the print edition. With full printing functionality, the CD has all of the added benefits associated with CD-ROM technology, such as easy searching and browsing and hypertext linking and bookmarking,. As a bonus, the CD-ROM also contains both 1996 supplements. Some of the other features include:

  • Compatibility with Macintosh and Windows platforms
  • Simple and Boolean searching
  • Intuitive push button data navigation through the Acrobat interface
  • True page image replication on the computer screen
  • Page zoom enlargement and reduction
  • Word Stemming and Word Proximity searching
  • Thesaurus searching
  • Searchable on-line users guide
  • Table of Contents

    PHYSICAL DEPOSITION TECHNIQUES
    Thermal Evaporation (Coordinating Editors: E.B. Graper and J. Vossen)
    Introduction and general discussion (E.B. Graper)
    Resistance evaporation (E.B. Graper)
    Electron beam evaporation (E.B. Graper)
    Ion vapor evaporation (E.B. Graper)
    Cathodic arc deposition (P.J. Martin)
    Laser ablation (A. Morimoto and T. Shimizu)

    Molecular Beam Epitaxy (Coordinating Editors: S.A. Barnett and J. Poate)
    Introduction and general discussion (S.A. Barnett and I.T. Ferguson)
    Semiconductor growth by metalorganic molecular beam epitaxy (MOMBE) (C.R. Abernathy)
    Gas-source MBE (G.Y. Robinson)
    Chemical beam epitaxy (T.H. Chiu)
    Thin film deposition and dopant incorporation by energetic particle sources (S. Strite and H. Morkoc)

    Sputtering (Coordinating Editors: S.I. Shah and D. Glocker)
    Introduction and general discussion (S.I. Shah)
    Glow discharge sputtering (A.S. Penfold)
    Magneton sputtering (A.S. Penfold)
    Ion-beam sputtering (T. Itoh)

    Thermal Spraying (Coordinating Editor: R.C. Tucker Jr.)
    Introduction to thermal spray coatings (R.C. Tucker Jr.)
    Flame spray (P.A. Kammer)
    Plasma spray coatings (R.C. Tucker Jr.)
    High velocity oxy-fuel coatings (R.C. Tucker Jr.)
    Detonation gun deposition (R.C. Tucker Jr.)
    Mechanical, wear, corrosion, and other properties of thermal spray coatings (R.C. Tucker Jr.)

    CHEMICAL DEPOSITION TECHNIQUES
    Chemical Vapor Deposition (Coordinating Editor: L. Vescan)
    Introduction and general discussion (L. Vescan)
    Metalorganic chemical vapour deposition (MOCVD) (R.D. Dupuis)
    Photoassisted chemical vapour deposition (S.J.C. Irvine)
    Thermally activated chemical vapour deposition (L. Vescan)
    Atomic layer epitaxy (T. Suntola)

    PROCESSING TECHNOLOGIES
    Pattern Transfer (Coordinating Editor: J.W. Coburn
    Introduction and general discussion (J.W. Coburn)
    Reactive ion etching (C. Steinbruchel)
    Ion-beam-based chemical dry etching (C. Steinbruchel)
    Ion milling (C. Steinbruchel)

    REAL-TIME DIAGNOSTICS
    Introduction and General Discussion (Coordinating Editor: R.W. Collins)
    Diagnostic Techniques
    Reflection high-energy electron diffraction as a diagnostic technique (B.A. Joyce)
    Low-energy electron diffraction (Sheng-Liang Chang and P.A. Thiel)
    Reflection mass spectroscopy (R. Kaspi)

    Optical Diagnostics
    Infrared emission interferometry (A.J. Springthorpe)
    Reflectance anisotropy (B. Drevillon)
    Interferometry as an in situ probe during processing of semiconductor wafers (V.M. Donnelly)
    Ellipsometry (P. Snyder)
    Photoluminescence (P.R. Berger)
    Elastic laser light scattering (B. Gallois)

    Plasma Probes
    Langmuir probe diagnostics (N. Hershkowitz)
    Microwave interferometers (R.A. Breun)
    Atomic absorption spectroscopy (Chih-shun Lu)

    Other Diagnostics (Coordinating Editor: R. Collins)
    Quartz monitors and microbalances (J. Krim and C. Daly)
    Probes of film stress (D. Glocker)

    SURFACE MODIFICATION IN VACUUM
    Processes for Substrate Cleaning (D. Mattox)
    Surface Treatment for Corrosion and Wear Protection
    Material aspects of corrosion protection (Cathy Cotell)
    Ion implantation with beams (Mike Nastasi)
    Plasma source ion implantation (Donald Rej)

    Surface Treatment of Polymers for Adhesion
    Plasma sources for polymer surface treatment (M.R. Wertheimer and Edward Liston)
    Surface chemistry of treated polymers (Lou Gerenser)

    MATERIALS
    Hard and Protective Materials
    Introduction (O. Knotek and A. Schrey)
    TiN
    TiAIN
    TiAIVN
    CrN
    ZrN
    HfN
    BN
    Diamond
    Ni-Cr-B-Si
    Al-bronze
    Al2O3-TiO2

    Electronic Materials
    Introduction (K. Cadien and S. Sivaram)
    GaAs
    a-Si:H
    AlGaAs
    Tellurides
    CuInSe2
    Si
    Ge
    Si-Ge
    W
    GaN
    AIN
    ErAs
    Quaternaries
    Silicides
    SiSnC
    SiN

    Optical Materials
    Introduction (J. Targove)
    AIN
    ZnO
    PbTiO3
    KNbO3

    Ferroelectric Materials
    Introduction (M. Sayer)
    Bi4Ti3O12
    LiNbO3 and LiTaO3
    PbTiO3/PbZrTiO3

    Ferromagnetic Materials
    Introduction (E.M.T. Velu and D.N. Lambeth)
    CoCr
    TbFeCo
    CoPt/CoPd
    GdTbFe

    Superconducting Materials
    Introduction (J. Azoulay)
    NbN
    YBa2Cu3O7
    Thallium-based compounds
    Mercury-based compounds

    Miscellaneous Materials
    PTFE
    PPN
    Ir/Pt

    Appendix A: List of Contributors
    Subject Index

    ...
    View More